Cathodoluminescence Study of Micro-crack-induced Stress Relief for AlN Films on Si(111)

نویسندگان

  • G. SARUSI
  • J. SALZMAN
  • B. MEYLER
  • M. SHANDALOV
  • Y. GOLAN
چکیده

1.—Department of Physics, The Ilse Katz Center for Nano and Meso Scale Science and Technology, Ben-Gurion University of the Negev, P.O. Box 653, Beer-Sheva 84105, Israel. 2.—Department of Electrical Engineering, Solid State Institute and Microelectronic Center, Technion, Haifa 32000, Israel. 3.—Department of Materials Engineering, The Ilse Katz Center for Nano and Meso Scale Science and Technology, Ben-Gurion University of the Negev, P.O.B 653, Beer-Sheva 84105, Israel. 4.—E-mail: [email protected]

برای دانلود متن کامل این مقاله و بیش از 32 میلیون مقاله دیگر ابتدا ثبت نام کنید

ثبت نام

اگر عضو سایت هستید لطفا وارد حساب کاربری خود شوید

منابع مشابه

Microcrack-induced strain relief in GaN/AlN quantum dots grown on Si(111)

The optical properties of vertically stacked self-assembled GaN/AlN quantum dots QD’s grown on Si substrates were studied by means of temporally and spatially resolved cathodoluminescence CL . An analysis of the CL spectra, thermal activation energies, and measured decay times of the QD luminescence was performed near stress-induced microcracks, revealing changes in the optical properties that ...

متن کامل

Investigation of AlGaN/GaN high electron mobility transistor structures on 200-mm silicon (111) substrates employing different buffer layer configurations

AlGaN/GaN high electron mobility transistor (HEMT) structures are grown on 200-mm diameter Si(111) substrates by using three different buffer layer configurations: (a) Thick-GaN/3 × {AlxGa1-xN}/AlN, (b) Thin-GaN/3 × {AlxGa1-xN}/AlN, and (c) Thin-GaN/AlN, so as to have crack-free and low-bow (<50 μm) wafer. Scanning electron microscopy, energy-dispersive X-ray spectroscopy, high resolution-cross...

متن کامل

Control of polarized emission from selectively etched GaN/AlN quantum dot ensembles on Si(111)

Multiple layers of GaN/AlN quantum dot (QD) ensembles were grown by the Stranski-Krastanov method on Si(111) using molecular beam epitaxy. During the subsequent cooling from growth temperature, the thermal expansion coefficient mismatch between the Si substrate and GaN/AlN film containing the vertically stacked QDs leads to an additional biaxial tensile stress of 20–30 kbar in the III-nitride f...

متن کامل

The Resurgence of III-N Materials Development: AlInN HEMTs and GaN-on-Si

Heterostructure devices based on the AlInN material system have demonstrated unprecedented high frequency performance but are still limited by materials issues. Likewise, improved crystal growth schemes are envisioned as a key component in the realization of GaN-on-Si high voltage devices for power electronics applications. This work presents materials optimization results from MOCVD growth of ...

متن کامل

Microstructure of low temperature grown AlN thin films on Si„111..

AlN thin films were grown on HF-etched Si~111! substrates at 400– 600 °C by plasma source molecular beam epitaxy. Reflection high energy electron diffraction and transmission electron microscopy studies show that AlN films grown at 400 °C form an initial amorphous region at the interface, followed by c-axis oriented columnar grains with slightly different tilts and twists. AlN films grown at 60...

متن کامل

ذخیره در منابع من


  با ذخیره ی این منبع در منابع من، دسترسی به آن را برای استفاده های بعدی آسان تر کنید

برای دانلود متن کامل این مقاله و بیش از 32 میلیون مقاله دیگر ابتدا ثبت نام کنید

ثبت نام

اگر عضو سایت هستید لطفا وارد حساب کاربری خود شوید

عنوان ژورنال:

دوره   شماره 

صفحات  -

تاریخ انتشار 2006